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“Background Nowadays, plasmonic materials and structures are the subject of wide-scale studies. In addition to metals, new materials like wide bandgap semiconductors [1, 2] and glass-metal nanocomposites (GMN) Orotic acid [3–5], that are glasses embedded with metal nanoparticles, have recently been implemented in plasmonics. Since the dielectric function and, consequently, the propagation of surface plasmon polariton modes in the latter materials can be controlled by varying the volume fraction, size, and type of metal inclusions [5–7], the flexibility of GMN makes them attractive for plasmonics. The required dimensions of the majority of plasmonic structures [8–10] are in tens of nanometers scale, which compels the use electron beam lithography (EBL) in their fabrication. That is why the search for an alternative cost-effective technique for their manufacturing is of interest.